Mesocrystals: Formation, structure and properties

Institutions
  • Department of Chemistry
  • WG Schmidt-Mende (Experimentalphysik mit SP Energie und Nanostrukturen)
Publications
  Kalb, Julian; Dorman, James A.; Gerigk, Melanie; Knittel, Vanessa; Plüisch, Claudia Simone; Trepka, Bastian; Lehr, Daniela; Wittemann, Alexander; Polarz, Sebastian; Schmidt-Mende, Lukas (2018): Influence of substrates and rutile seed layers on the assembly of hydrothermally grown rutile TiO2 nanorod arrays Journal of Crystal Growth. 2018, 494, pp. 26-35. ISSN 0022-0248. eISSN 1873-5002. Available under: doi: 10.1016/j.jcrysgro.2018.05.004

Influence of substrates and rutile seed layers on the assembly of hydrothermally grown rutile TiO2 nanorod arrays

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Rutile TiO2 nanorod arrays (NRAs) are applicable in various prospective technologies. Hydrothermal methods present a simple technique to fabricate such NRAs. In this report, we present the fabrication of seed layers for the hydrothermal growth of rutile TiO2 nanorods via sputter deposition, electron-beam evaporation, and sol-gel method and study the influence of each on the growth behavior. To satisfy the requirements of numerous applications, p-type silicon, platinum, levitating carbon membranes, a template made of polystyrene spheres, and commercial fluorine tin oxide (FTO) were employed as substrates. We document the structural properties of the TiO2 seed layers and describe the relationship between the characteristics of the seed crystals, the growth evolution, and the appearance of as-grown nanorods. Various growth stages of rutile TiO2 nanorods are compared depending on whether they are grown on polycrystalline TiO2 or FTO seed layers. In both cases, a homogenous TiO2 bottom layer is formed at the seed layer/substrate interface, which is essential for electronic applications such as hybrid solar cells. Detached NRAs illustrate the effect of rutile FTO and TiO2 on the porosity of this bottom layer. Further details about the formation process of this layer are obtained from the growth on confined seed layers fabricated by electron-beam lithography.

Origin (projects)

Funding sources
Name Finanzierungstyp Kategorie Project no.
SFB third-party funds research funding program 588/16
Further information
Period: since 30.06.2020